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本公司脈沖直流磁控濺射電源具備如下顯著特點:

1.采用先進的逆變技術(shù)與進口IGBT模塊搭配設(shè)計有效減少電荷累積效應(yīng)，提升膜層質(zhì)量。

2.理想的電壓陡降特性，充分適配鍍膜工藝連續(xù)性需求電源參數(shù)大范圍連續(xù)可調(diào)，控制精度高具有抑制靶材弧光放電及抗短路功能。

3.本電源適用于金屬、合金、石墨等靶材鍍制金屬膜、碳膜以及部分氧化物、氮化物和碳化物膜等工藝。

Our company's Pulsed Direct Current Magnetron Sputtering Power Supply has the following distinctive features:

1. By adopting advanced inverter technology paired with imported IGBT modules, it effectively reduces the charge accumulation effect, enhancing film layer quality.

2. It offers ideal voltage drop characteristics, fully accommodating the continuous requirements of the coating process. The power supply parameters can be adjusted continuously over a wide range, with high control accuracy. It also features arc suppression for target materials and short-circuit resistance.

3. This power supply is suitable for sputtering metal films, carbon films, and certain oxides, nitrides, and carbides from target materials such as metals, alloys, and graphite.